Henry Smith

Henry Smith

Professor of Electrical Engineering Emeritus, Electrical Engineering and Computer Science (EECS) in Instituto de Tecnología de Massachusetts

Prof. Smith and his co-workers were responsible for a number of innovations in nanoscale science and engineering, including:  comformable-photomask lithography, x-ray lithography, the phase-shift mask, the attenuating phase shifter, spatial-phase-locked e-beam lithography, achromatic-interference lithography, coherent-diffraction lithography, immersion photolithography, zone-plate-array lithography, absorbance-modulation optical lithography, interferometric alignment, graphoepitaxy, subboundary entrainment, templated self-assembly, nanomembrane assembly, and a variety of quantum-effect, short-channel, single-electron, nanomagnetic, photonic-crystal and microphotonic devices. Prof. Smith holds over 40 US patents and has published over 400 technical articles.

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